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Horizontal Furnaces
c.HORICOO 300
c.HORICOO 300
Description：
The centrotherm c.HORICOO 300 horizontal batch-type system is the world‘s first high-throughput platform for state-of-the-art 300 mm wafer processing. The equipment platform consists of two 4-stack furnaces that are loaded by one central automation unit. The heating system comprises 5 dual-zone heating elements that provide the centrotherm well-know temperature uniformity as well as an optimal and steady process. The centrotherm Hydrox system supports wet oxidation processes with different moisture contents. Temperatures up to 1200 °C allow faster oxidation and shorter drive-in processes.
Applications : Diffusion, Oxidation, Annealing, LPCVD, PECVD, Curing
Substrates : Si, SiC, Ge
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