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High Temperature Oxidation Furnace
c.OXIDATOR 150
c.OXIDATOR 150
Description：
c.OXIDATOR 150 is a high-temperature furnace, especially designed for the oxidation of silicon carbide (SiC) by centrotherm.
Its capability to run high process temperatures of up to 1500°C and oxidation processes using O2, N2O, NO, NO2 or WetOx atmosphere makes for an excellent combination of flexibility and proven process quality. Equipped with metal-free heating and double vacuum, c.OXIDATOR 150 is currently the safest ToxGas oxidation furnace on the market.
Applications : Oxidation
Features
Batch processing of 2“, 3“, 100 mm and 150 mm wafers or any combination
Maximum heating rate up to 7.5 K/min
Batch size up to 50 (150 mm) wafers
Process pressure range from 850 mbar to atmospheric pressure
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