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Vertical Furnaces
c.VERTICOO 200
c.VERTICOO 200
商品简述：
Designed for high volume production with a maximum throughput rate and a high degree of flexibility, c.VERTICOO 200 is suitable for all standard atmospheric and low pressure CVD processes. The single tube set-up with dual boat logistics is optimized for minimum handling time as well as low cost of ownership with low maintenance costs.
Applications : Diffusion, Oxidation, Annealing, LPCVD
Substrates : Si, SiC, Ge
Features
Up to 150 process wafers per batch
Auto alignment
Dual boat logistics
Water cooled heating cassette
Small footprint
Side by side installation possible
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